الفهرس 
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Abstract
in this study, magnetron sputtering ion plating (msip) was used to apply layers of tialn, tialcn, tialoc and tialocn at different deposition pressures, namely (102 mbar), (5 x 103 mbar) and (35 x 104 mbar). the percentage of reactive gases was ranging from 5 % to 35%, these reactive gases are nitrogen acetylene and carbon dioxide or mixture of these gases was used with tial as target. the effect of these percentages on mechanical properties of the deposited layers is considered. many tests were preformed to investigate the mechanical properties of deposited layers such as scratch test, adhesion and cohesion strength test and hardness test, also the formed phases were investigated by xray diffraction and morphology of the layers was examined by scanning electron microscopy. ion implantation as surface modification technique was also used to improve the mechanical properties of tial deposited layer and wcco as substrate material. deposited layer of tial, was implanted by nitrogen, carbon, boron, titanium and aluminum ions with energies 50 200 kev at different doses. as a general conclusion the low deposition pressure 5 x 103 mbar with reactive gases