الفهرس 
1.1 Computational Fluid DynamicsOnly 14 pages are availabe for public view
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Abstract
Capacitively coupled plasma (CCP) is used extensively in plasma processing, such as, plasma etching, deposition, and sputtering. Particle-in-Cell (PIC) is used to explore the discharge dynamics microscopically. Considering all species in PIC simulation is challenging. Also, considering various atomic transitions, e.g., ionization, recombination, excitation, and deexcitation is not doable. The state of the art is to carry out fluid simulation. We compare between PIC and fluid simulation for radio frequency CCP to reveal the effect of various approximations as assuming constant temperature, simplifying Navier-Stokes equations in terms of particles mobility and diffusivity, and considering artificial boundary conditions at the electrodes. The fluid model predicts qualitatively PIC results in few minutes. For Ar/CF4 discharge in geometrically symmetric CCP, the plasma bulk is quasineutral. Over the electrodes, two sheaths are built up due to the difference between ion and electron fluxes. The dynamics of two sheaths are out of phase. In the fluid model, chemical reactions and atomic processes can be considered. Argon metastable states and CF4 content densities is maximum in the plasma bulk. In semi dark sheaths, metastable states concentration is small. The proposed fluid model could be used as a simulation platform to find the optimum conditions and to interpret experimental results.