الفهرس 
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Abstract
Cadmium Sulfide (CdS) thin films with different thicknesses were prepared by pulsed laser deposition (PLD) technique under high vacuum (~10-6 Torr) using Nd:YAG laser with wavelength 1064 nm. The deposition process can be described in three steps covering the laser – target interaction, the expansion of the plasma plume and the film deposition.The films were deposited on quartz substrates, kept at room temperature during the deposition. Indium electrodes were evaporated on the CdS thin films for electrical measurements. The prepared thin films of different thicknesses are given as follow.