![]() | Only 14 pages are availabe for public view |
Abstract Amorphous carbon nitride thin films were deposited on polmer substrates using radio frequency (rf) plasma in a mixture of nitrogen (N2) and acetylene (C2H2) gasses. the samples were prepared at different rf plasma power (350,300,450,500,and 550 w), at constant plasma exposure time of 10 min. |